发明名称 METHOD AND DEVICE FOR WASHING PHOTOMASK
摘要 PURPOSE:To perfectly remove attached matters of >=3mum size and to prevent stains, etc. during drying of a washing soln. by wetting a photomask with an electrolytic soln., showing it with an alcohol type org. solvent, cleaning it with fluorinated hydrocarbon vapor, and drying it. CONSTITUTION:In an electrolytic soln. vessel 100, a photomask 10 is washed with aq. ammonia 2 filtered with a filter 16 and having prescribed purity, and thereafter, the use of the aq. ammonia 2 prevents electrification of the photomask 10, and attachment of dust, etc. perfectly in the following steps. In a shower vessel 200, isopropanol 9 is sprayed on the photomask 10 to substitute isopropanol 9 for the aq. ammonia 2 and to help the next drying step. In a vapor vessel 300, the photomask 10 is dried perfectly in a short time by once immersing it in trichlorotrifluoroethane 13 vapor and taking it out.
申请公布号 JPS59195654(A) 申请公布日期 1984.11.06
申请号 JP19830070503 申请日期 1983.04.21
申请人 NIPPON DENKI KK 发明人 HISAMICHI MASATAKA
分类号 B08B3/08;G03F1/00;G03F1/82;H01L21/304 主分类号 B08B3/08
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