| 摘要 |
PURPOSE:To remove thoroughly the unexposed parts of the photosensitive layer of an exposed photosensitive lithographic printing plate without exerting unfavorable influence by bringing a developer composition contg. a compound represented by a specified general formula into contact with the printing plate. CONSTITUTION:This developer composition for developing a photosensitive material having a photosetting photosensitive layer contg. photosensitive diazo resin is an aqueous soln. contg. at least one kind of compound represented by formula I . In the formula, A is optionally substituted aryl; R1 is H or lower alkyl; M is H, an alkali metal or ammonium; (m) is 0 or an integer of >=1; (n) is 0 or a positive number; (m) and (n) are not 0 at the same time; and (p) is an integer of 1-5. Compounds represented by formulae II, III are examples of the compound represented by the formula I . The concn. of the compound in the aqueous soln. is 0.1-10wt% in general. |
