| 摘要 |
In a sliding boat liquid phase epitaxy apparatus a base structure, a support substrate disposed on the base and being horizontally fixed with respect to the base, and a slidable well member disposed above the substrate in an abutting relationship are included. The slidable well member has at least one well capable of holding a growth solution for growing epitaxial layers on substrates. A significant problem in growth of layers by liquid phase epitaxy when using a sliding boat apparatus occurs by the inability to achieve a sufficiently good wipe-off so as to produce a layer having a smooth surface. The apparatus of the present invention includes in the structure of a sliding boat apparatus a substrate support structure including a block provided with a flat-bottom recess in part of the top surface of the block and between the ends of the blocks, and a plate is fitted into the recess so that the top surface of the plate is level with the top surface of the block outside of the recess. The plate is provided with an aperture capable of containing a substrate on which an epitaxial layer is to be grown, and can be disposed under one well of the slidable well member. The plate and well member are made of different materials. |
