| 摘要 |
PURPOSE:To vapor-deposit a hard gold alloy by using a gold alloy and one or more kinds of hardening metals selected among Ti, Zr, Cr and alloy thereof as targets and by carrying out sputtering in an atmosphere of a gaseous mixture consisting of N2, NH3 and Ar blended in a specified ratio. CONSTITUTION:A gold alloy and one or more kinds of hardening metals selected among Ti, Zr, Cr and alloys thereof are used as targets, and sputtering is carried out in an atmosphere of a gaseous mixture consisting of 1-80vol% N2 and/or NH3 and the balance Ar. A hard gold alloy contg. 0.5-5wt% hardening metals in the gold alloy chiefly in the form of nitrides is vapor-deposited on the surface of a base member. |
