VERTICAL JUNCTION FIELD-EFFECT TRANSISTOR AND PROCESS FOR ITS PRODUCTION

摘要

This transistor comprises a first main surface of alternating source and gate strips. A gate metallization rests on the gate strips and a source metallization rests on a polycrystalline silicon rail formed above the source strips. Such a device can be manufactured by entirely self-aligned methods and is applicable particularly to the very high frequency range up to a few dozen gigahertz.