发明名称 |
Sensitive positive electron beam resists |
摘要 |
Highly sensitive positive electron beam resists comprised of copolymers of methacrylic acid (MAA) and t-butyl methacrylate (TBM) are disclosed in which a thin film of high molecular weight MAA/TBM copolymer is applied to a suitable substrate. Prior to exposure, the copolymer is prebaked at a temperature below the decomposition temperature to improve the sensitivity and resolution of the resist. The exposed resist is developed by spraying with a suitable solvent. The positive electron resists produced in accordance with the present invention exhibit a high sensitivity and good submicron resolution.
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申请公布号 |
US4476217(A) |
申请公布日期 |
1984.10.09 |
申请号 |
US19840578987 |
申请日期 |
1984.02.13 |
申请人 |
HONEYWELL INC. |
发明人 |
DOUGLAS, RICHARD B.;FURE, BARBARA J.;LAI, JUEY H. |
分类号 |
B05D3/10;G03F7/039;(IPC1-7):B05D3/02;G03C5/16;G03C5/24 |
主分类号 |
B05D3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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