发明名称 |
Electrochromic films having improved etch resistance |
摘要 |
Thin, amorphous electrochromic layers deposited on substrate electrodes by, for example, vacuum deposition techniques, are subjected to a special heat treatment at a selected high temperature for a selected short time to convert at least a free surface portion of each layer to be exposed to the electrolyte from the amorphous form to a crystalline form while preventing excessive water loss which might adversely affect the electrochromic properties of the layer for display purposes. Crystallization of at least the free surface portion of the electrochromic layer significantly increases its etch resistance whereas retention of water in the electrochromic layer maintains satisfactory electrochromic properties for display purposes.
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申请公布号 |
US4475795(A) |
申请公布日期 |
1984.10.09 |
申请号 |
US19800198683 |
申请日期 |
1980.10.20 |
申请人 |
TIMEX CORPORATION |
发明人 |
LEIBOWITZ, MARSHALL;CRANDALL, RICHARD;FAUGHNAN, BRIAN |
分类号 |
G02F1/15;(IPC1-7):G02F1/17 |
主分类号 |
G02F1/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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