发明名称 METHOD FOR ADJUSTING CONCENTRATION OF HYDROGEN ION IN PLATING SOLUTION
摘要 PURPOSE:To adjust automatically the pH of a plating soln. and to stabilize plating operation by providing a pH adjusting cell on the outside of a plating cell and changing the pH in the pH adjusting cell in the direction opposite from the direction where the pH of the electrolyte in the plating cell changes. CONSTITUTION:A plating soln. 1 is circulated through a plating tank 3, a pH adjusting cell 10 and a plating cell 2 by the operation of a pump 16. A body to be plated is attached to a cathode 7 in the cell 2 and electricity is conducted from an electric power source 9 to an anode 8 and the cathode 7, by which plating is accomplished. On the other hand, a cathode 11 and an anode 12 are provided to the cell 10 and the cathode 7 and the anode 8 in the cell 2 are so set that the changing direction of the pH during plating, i.e., the direction of + or - is re versed. The pH is thus offset by the circulation of the plating soln. and the plating is stabilized without fluctuation.
申请公布号 JPS59177389(A) 申请公布日期 1984.10.08
申请号 JP19830050654 申请日期 1983.03.26
申请人 FUJITSU KK 发明人 OZASA IKUO;NAKAMURA KAZUO
分类号 C25D5/00 主分类号 C25D5/00
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