| 摘要 |
PURPOSE:To obtain a vertical magnetic recording medium having an excellent magnetization characteristic on a low melting substrate as well by depositing a specific element by sputtering on the substrate at the same instant when Co or Co-Ni alloy is vapor deposited by electron beam on the substrate. CONSTITUTION:While a substrate 1 is moved from a delivery roll 2 to a take- up roll 4 along a rotary support 3 that can be cooled, Co or Co-Ni alloy 8 is used as an evaporating source I and the vapor flow 5 accelerated by the electron radiated from an electron beam generating source 9 is deposited by evaporation on the substrate surface. On the other hand, one kind of the element selected from Sm, Cr, Mo, W, V and Ru is used as an evaporating source II and is sputtered in such a way that said element is distributed over the entire region of the substrate 1 exposed to the vapor flow 5 with said source as a sputtering cathode 10. The compsn. ratio of Co, Ni and other additive element is thus maintained always constant, and since the vapor deposition speed of Co and Co- Ni is increased, the recording medium having an excellent vertical magnetization characteristic is obtd. with good productivity. |
