| 摘要 |
PURPOSE:To manufacture inexpensively monosilane in good yield by bringing halogenated silicon into contact with inorg. solid acid. CONSTITUTION:Inorganic solid acid such as acid clay, Al2O3, sulfuric acid deposited on silica gel is used (about -11.93-3.3 Hammet's acidity function and granular shape are preferable). Vaporous halogenated silicon (e.g. SiCl4, SiHCl3, SiF4) is passed through a reaction system packed with above-mentioned acid to bring into contact with said acid at less the melting point of the acid, and at a temp. as high as possible for about 0.1-2sec. Monosilane is fractionated from the gas obtd. as the reaction product.
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