| 摘要 |
PURPOSE:To form films which have the same film structure and further preferable coating property at the stepwise difference on the side faces of ground stepwise difference and a flat face by applying a DC voltage between an anode and a cathode. CONSTITUTION:Anode 2 and cathode 3 of flat plate shape are opposed in a reaction vessel 1. A heater 4 is provided under the cathode 3. A substrate 5 to form a vapor grown film is placed on the cathode 3, and heated by a heater 4. On the other hand, a high frequency power source 6 and a DC power source 7 are coupled through a matching unit 8 to the anode 2 from the exterior of the vessel 1. In other words, the voltages of high frequency and DC are simultaneously applied between the electrodes. |
