| 摘要 |
PURPOSE:To continuously irradiate X-rays, by providing a vacuum-spark plasmatic X-ray source with an exhaust pipe having an inlet port near the opposed electrodes of the source, and by coupling the pipe to a vacuum pump to evacuate a hot gas at the time of discharge. CONSTITUTION:In a vacuum-spark plasmatic X-ray source for an X-ray lithography device or the like, a pair of electrodes 2, 3, at least one of the opposed tips of which is made of a discharging substance, are provided in a vacuum container 1, and a heavy current is caused to flow from a power supply 8. The evacuating inlet port 11 of an exhaust pipe is placed near the opposed tips of the electrodes 2, 3. The outlet port of the pipe is coupled to a vacuum pump. The hot gas of the discharging substance is sucked. The flow of the hot gas is blocked by baffle plates 12 so that the hot gas is solidified and then dropped into an accumulation chamber 16. As a result, electric insulation can be quickly recovered after discharge. Therefore, X-rays can be continuously irradiated. |
