| 摘要 |
PURPOSE:To uniforming the thickness of grown thin film by swinging the plasma with a deflecting means composed of deflecting coils and a deflecting A.C. power source when producing glow discharge between discharge electrodes arranged oppositely facing to make compound gas into plasma-state and depositing the generated ion on the substrate to grow thin film. CONSTITUTION:When eccentric coils are arranged on a lower discharge elec- trode 3 carrying plural substrates 5, three eccentric coils 6A-6C are arranged in a manner centers of the coils are present in uniform intervals on a concentric circle of the electrode 3 and also are located between the electrode 3 and an upper discharge electrode not shown in figure. Nextly, a three-phase A.C. power source 8 for deflection is connected to those coils with using lead wires 7A-7C and compound gas sealed between the upper discharge electrode and the lower discharge electrode 3 is made to be in plasma-state. Leaving this condition as it is, the coils 6A-6C are conducted the electric current to generate revolving magnetic field changing its intensity with time thereby dispersing the ion generated by ionization over the whole surface of the electrode 3 uniformly. |
