| 摘要 |
PURPOSE:To make the density of a heating element higher by a method in which specific resistor layers and specific conductor layers are orderly laminated on a base plate, and the resistor layers are subjected to a plasma etching process to uniformly process the heating element of a fine constitution. CONSTITUTION:At least a resistor layer 2, selected from tantalum-silicon oxide (Ta-SiO2), tantalum nitride (TaN), tantalum-silicon (Ta-Si) and polycrystal silicon (poly Si), and a conductor layer 3 of aluminum, etc., are laminated on a base plate 1. The resistor layer 2 and the conductor layer 3 are etched into a comb- tooth form, a window 4 is provided in the conductor layer 3, and plural heating elements 5 are formed in rows. The resistor layer 2 is etched by a plasma etching method by using the resist layer 6 and the conductor layer 3 as etching masks. |
