发明名称 Sputtering target
摘要 A sputtering target comprises a backing plate, a mosaic layer laid on the backing plate, and a keep jig contacting the inner peripheral edge and outer peripheral edge of the mosaic layer, thus attaching the layer to the backing plate. The mosaic layer is substantially circular and consists of a first group of fan-shaped plates made of a first target material and a second group of fan-shaped plates of a second target material. The plates of the second group are divided into subgroups each consisting of at least one plate. These subgroups are interposed among the fan-shaped plates of the first group. The plates have a notch in the narrower end, are connected side by side to each other, and are arranged with top surfaces flush with one another.
申请公布号 US4468313(A) 申请公布日期 1984.08.28
申请号 US19830519906 申请日期 1983.08.03
申请人 TOKYO SHIBAURA DENKI KABUSHIKI KAISHA 发明人 OKUMURA, KATSUYA;UEDA, MASAAKI
分类号 C23C14/34;H01J37/34;(IPC1-7):C23C15/00 主分类号 C23C14/34
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