发明名称 |
Electrolytic full regeneration process for an ammoniacal etching solution |
摘要 |
Known regeneration plants for the full regeneration of ammoniacal tetraamminocupric etching solution operate in accordance with the principle of liquid-liquid extraction. In accordance with the invention, the regeneration is effected by direct electrolysis of the etching solution without prior extraction. The etching solution of the invention consists of tetraamminocupric sulphate, ammonia, ammonium sulphate and a catalyst in order to increase the rate. The etched copper and the etching chemicals used are continuously recovered in a closed circuit by direct electrolysis of the etching solution.
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申请公布号 |
DE3305319(A1) |
申请公布日期 |
1984.08.16 |
申请号 |
DE19833305319 |
申请日期 |
1983.02.16 |
申请人 |
SIEMENS AG |
发明人 |
KONSTANTOUROS,EFTHIMIOS,DIPL.-CHEM.DR.RER.NAT.;HOELLMUELLER,HANS;HAAS,RAINER |
分类号 |
C23F1/34;C23F1/46;(IPC1-7):C23F1/00;C25D3/38;C25F7/02 |
主分类号 |
C23F1/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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