| 摘要 |
PURPOSE:To lower scattering of width of a patternwise film by forming said film on a film capable of inhibiting etching of a flat glass plate substrate, formed on the principal face of the substrate. CONSTITUTION:A film, such as alumina film, capable of inhibiting etching of a flat glass substrate 21 is formed on its principal face by a chemical vapor deposition method or the like, and on this film a patternwise film 22 is formed. As a result, the obtained glass mask is prevented from side etching of the substrate 21 at the time of dry etching for forming a patternwise film, and from deterioration of precision of a transferred pattern due to scattering of light at the time of exposure. |
