发明名称 PRESENSITIZED PLATE FOR USE IN LITHOGRAPHY INCLUDING A DIAZO COMPOUND WHICH HAS BEEN PRETREATED BY HEATING, UV LIGHT, LASER OR ELECTRON BEAM
摘要 <p>A presensitized plate adapted for use in lithography comprising a support member with a metal surface, e.g. aluminum metal, and overlying layer containing a diazo compound. In accordance with this invention, the relative exposure sensitivity of the diazo compound is improved by pretreatment to accelerate its reactivity in the presence of actinic light. One method of pretreatment involves preheating the diazo compound to a temperature above about 35.degree.C up to about 120.degree.C. The improved lithographic plate and the process of preparing plate are claimed.</p>
申请公布号 CA1171713(A) 申请公布日期 1984.07.31
申请号 CA19810383693 申请日期 1981.08.12
申请人 POLYCHROME CORPORATION 发明人
分类号 G03F7/004 主分类号 G03F7/004
代理机构 代理人
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