| 摘要 |
PURPOSE:To achieve fine and highly accurate photo-etching even at the overlapped section of photomask by rounding a deflection electrode pattern sheet tubularly then adhering the joint through adhesives having reflactive index near to that of pattern material thereby improving deformation of pattern shape. CONSTITUTION:A required photomask 4 is lapped around with diameter slightly shorter than the inner diameter of outer tube 1 while utilizing a tubular zig such that photographic make-up deflection electrode patterns 4', 4'' are matched then heated under predetermined temperature to plastic deform the mask 4 thereafter the leading edge section 8' of said overlapped section is applied with transparent adhesives having reflaction index near to that of mask 4 to eliminate step 9 over entire overlapped section. Tubular bags 13, 14 of resin system are arranged at both ends 11, 12 except overlapped sections 4', 4'' of mask 4 then said tubular mask 4 is inserted into an outer tube 1 where photoresist 3 is applied onto a metal film 2 at the inner wall of tube 1 and secured at predetermined position thereafter fluorescent lamp for emitting plenty of ultraviolet beam is inserted into the mask 4 while air is fed into said bags 13, 14 to inflate the mask 4 in normal direction thus to contact tightly with the inner wall of outer tube 1 thereafter exposed and etched to form an MS type deflection electrode. |
