| 摘要 |
PURPOSE:To improve SN ratio and resolution and to prevent the reduction of performance even if the titled device is used for a long time by forming a recessed groove on a wear proof material layer part of an illuminated light reflecting area for a photodetecting element array. CONSTITUTION:A light shielding layer 26 consisting of a vapor deposition film of Cr is formed on a transparent substrate 21 and then a lighting window 23 is formed by photolithoetching. Subsequently, an SiNH insulating film 27 is formed by decomposition method under RF glow discharge using mixing gas consisting of SiH4 and N2 so as to cover the whole surface of the light shielding layer 26 and then a noncrystal silicone film is formed by decomposition method under RF glow discharge using the SiH4 gas. A photodetecting element 22 array is formed on the silicone film and then an SiNH insulating film 28 is formed so as to cover the whole surface. Finally, a wear proof material layer 25 is formed on an ultraviolet hardened polymer, but an illuminated light reflecting area part for the lighting window 23 and the photodetecting element 22 array is washed away by using a solvent dissolving the polymer to form the recessed groove 29. |
