| 摘要 |
PURPOSE:To contrive to improve the transcription accuracy of a fine pattern by a method wherein a mask is closely contacted at the center of a wafer by allowing a fixed parallel gap at the time of the close contact of the mask with the wafer, thereafter, a two-step print gap system for further close contact in the periphery is adopted. CONSTITUTION:A wafer holder 22 which holds the wafer 21 is corrected by a mark position detector previously provided on the wafer 21, and then positioned as in the figure. The wafer holder 22 on which the wafer 21 is placed is lifted upward by the drive of a pulse motor, keeps the gap l between the mask 23 and the wafer 21 at 60mum, and becomes in a sealed state via packing seales 24. Next, the mask 23 is adsorbed to the wafer 21 by vacuum exhaust, and the center of the mask 23 bends and contact the wafer 21. Thereafter, they are put in close contact from the center to the periphery by finely moving and lifting upward the wafer holder 22 by driving the pulse motor. |
