发明名称 PHOTOSENSITIVE RESIN ORIGINAL PLATE
摘要 PURPOSE:To obtain a photosensitive resin original plate with superior printing resistance and suitability to high-speed printing by incorporating basic polyamide resin contg. nitrogen, a monomer having a polymerizable unsatd. bond, and a specified modifier having one or two terminal carboxyl groups into a photosensitive resin layer. CONSTITUTION:To 100pts.wt. basic polyamide resin (A) contg. nitrogen are added 5-200pts.wt. monomer (B) having a polymerizable unsatd. bond such as acrylamide or methyl acrylate and 3-50pts.wt. compound (C) represented by formula I or II (where each of R<1> and R<2> is 1-10C alkylene or phenylene, and (n) is 1-20) such as polyethylene glycol monosuccinate. They are mixed, and the mixture is blended with other necessary additives. The resulting photosensitive resin composition is coated on a substrate with an adhesive layer and an antihalation layer in-between, and by drying the coated composition, a photosensitive resin layer is formed to obtain the desired photosensitive resin original plate.
申请公布号 JPS59119345(A) 申请公布日期 1984.07.10
申请号 JP19820234321 申请日期 1982.12.24
申请人 TOYO BOSEKI KK 发明人 TOMITA AKIRA;NANHEI MASARU;FUJIMURA TOSHIAKI
分类号 G03F7/004;G03F7/037 主分类号 G03F7/004
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