| 摘要 |
PURPOSE:To obtain the titled composition with high suitability to image formation by adding an initiator which generates free radicals, an org. halogen compound, a dye which develops color under light and other dye to an ethylenic unsatd. compound and a film forming polymer. CONSTITUTION:A photosensitive resin composition is obtd. by blending 100pts.wt. in total of an ethylenic unsatd. compound (A) such as trimethylolpropane triacrylate and a film forming polymer (B) such as polymethyl methacrylate with an initiator (C) which generates free radicals under active rays such as benzophenone, 0.5-5pts.wt. org. halogen compound (D) such as tribromomethylphenylsulfone, 0.5-3.5pts.wt. dye (E) which absorbs ultraviolet rays of 100-400nm wavelengths and develops color under light such as leucocrystal violet, and 0.01-0.05pts.wt. other dye (F) such as malachite green. By using the composition, a sharp image can be formed, and defects after development can be easily detected, so the working speed can be increased. |
