| 摘要 |
PURPOSE:To form a PLZT optical gate array of a desired size, and also to manufacture it at a low cost by providing a PLZT layer and an optical shutter electrode on a substrate consisting of other material than PLZT. CONSTITUTION:A transparent substrate 2, for instance, a quartz substrate is prepared, and on its one surface 2a, films of NiCr and Au are formed successively. Subsequently, a common electrode 3 ana 3 switching electrode 4 are formed from the films of NiCr and Au. Thereafter, on the surface on which the electrodes 3, 4 are formed, PLZT is vapor-deposited to a uniform thickness by means of high frequency spattering, and a thin film-like PLZT layer 5 is formed. In this way, a lot of optical gate parts 6 are constituted of a part of the PLZT layer 5 between the common electrode 3 and each switching electrode 4. In the end, when the switching electrode 4 is bonded to a driving circuit, and the common electrode is grounded, a PLZT optical gate array 1 can be operated. Since the PLZT optical gate array can be formed to a desired size, the deterioration of resolution and troublesomeness for the position adjustment of the array, etc. can be prevented. |
