| 摘要 |
PURPOSE:To detect a specified pattern at high speed by means of detecting the position and inclination of X Y coordinates of an object to be detected by a method wherein two patterns are measured to calculate the coordinates positions and inclination of the object to be detected in terms of the results of the measurement. CONSTITUTION:Two marks are provided on two positions separated at specified distance on an object to be detected and in the first measurement, one mark is brought within the range of television to detect the X and Y positions of the mark. Next a wafer stage 5 is shifted by specified amount of XT in the direction of X bringing the other mark within the range of television to detect the positions X, Y of the second mark. Then the inclination may be calculated in terms of the positions of the first and second marks as well as the shifted amount of XT. |
