| 摘要 |
PURPOSE:To detect the change of relative positional relation with time within a short period of time and control the electron beam radiation position by disposing a conductive material piece providing a mark between the electron beam reflecting cylinder and an exposing sample setting surface of stage. CONSTITUTION:An electron beam is deflected to an orbit 18' and is located to 8-3 by a deflector 16 depending on the signal sent from a deflection control circuit 2 and moreover the reference mark 8 is focused by a focusing coil 17. The mark itself 8-1 of mark 8 is scanned by electron beam with the deflector 6 as indicated by a locus 8-4X or 8-4Y. The reflected electrons are captured by the reflected electron detector 7 and are sent to a signal processing circuit 3. The deflected data 13 and reflected electron signal inputted are compared each other. Corresponding mark position deflecting data is transferred to a computer 1, held therein and DELTAX, DELTAY are transferred to the deflection control circuit 2 and held therein. Change with time of electron beam position for the electron beam reflecting cylinder is compensated by renewing DELTAX and DELTAY. |
