| 摘要 |
PURPOSE:To enable to perform positionings of different types using the same device by a method wherein an alignment mark for mask position detection and an alignment mark for relative position detection of a mask and a wafer are formed into the same shape. CONSTITUTION:Alignment marks 20 and 21' of the same shape and contraction rate as alignment marks 54 and 54' are provided on a mask 1. Mask alignment marks 11 and 11' are provided on a lens barrel. Alignment marks 21 and 21' of the same shape as the marks 11 and 11' are provided on a wafer 4. The laser beam 30 injected from a laser beam source 22 is focussed at the point 31 on the surface of a rotary polyhedral mirror 28, and it is scanned on the mask 1 and the wafer 4 by the mirror 28. Light detectors 47 and 47' detect the intensity of light and measure the degree of alignment. The mask 1 and the wafer 4 are positioned by aligning marks 20, 20' and marks 21, 21'. The mask 1 is positioned for lens 3 by aligning marks 54, 54' and the marks 11, 11'. |
