| 摘要 |
PURPOSE:To obtain silicon nitride having high sinterability by heat-treating org. silazane polymer having Si, N, and C as skeletal components as precursor for silicon nitride. CONSTITUTION:Monosubstituted dichlorosilane expressed by the formula I (R is alkyl, aryl) is mixed with disubstituted dichlorosilane expressed by the formula II. Then, the mixture is allowed to react with alkylenediamine expressed by the formula III to obtain org. silazne polymer contg. Sin, N, and C as skeletal components. Further, the org. silazne polymer is decomposed by heat-treating in nonoxidizing atmosphere as precursor of silicon nitride to obtain aimed silicon nitride. The substituents of the above-described dichlorosilane may be CH3 or C6H5. Further, the proportion of disubstituted dichlorosilane to monosubstituted dichlorosilane may be 90mol%. |
