| 摘要 |
PURPOSE:To improve the reflectivity of an Al film in sputtering of an Al film by passing treatment gas through a material having a dehydration function to remove the moisture incooperated therein and the moisture adsorbed in a supply means for the treatment gas then admitting the gas into a vacuum vessel and performing an electric discharge treatment. CONSTITUTION:The inside of a vacuum vessel 8 of, for example, a sputtering device for an Al film is evacuated to vacuum by a vacuum evacuation system connected to a connection port 9 for evacuation. Gaseous Ar 15 is admitted through a gas introducing pipe 11b into the chamber 8 at the flow rate controlled with a flow rate control valve 11a, and adequate electric power is supplied thereto from a DC power source 15, thereby forming an Al film on the work 16. Activated alumina, silica gel, etc. 17 having a dehydration function is packed in the terminal part of the pipe 11b. |
