发明名称 PLASMA DEVICE
摘要 PURPOSE:To obtain a positive sealing function to a communicating hole, and to enable a secular periodic duty by mounting a plug body opening and closing the communicating hole interlocked with the movement operation of a sample to a sample chamber and a load locking chamber and a tightening mechanism contacting and detaching the plug body. CONSTITUTION:Microwaves from a magnetron M for a plasma device are projected to a plasma producing chamber 1 through a waveguide 2, and an etching chamber 3 is irradiated by produced plasma from an oppositely faced surface. Each casing 5a and 6a of a load lock 5 and a carrying means 6 are arranged oppositely to the etching chamber 3. A rod member 6c is disposed into the housing 6a of the casing 6a rotatably and slidably, and a base plate 8 for samples 7 is fixed at the nose of the rod member. A plug body 9 is turned around the member 6c in the vicinity of the nose section. A seat is formed to the periphery on the etching chamber 3 side of a communicating hole 3c contacting and detaching a plug body 9, and the communicating hole 3c is sealed positively.
申请公布号 JPS62117325(A) 申请公布日期 1987.05.28
申请号 JP19850257362 申请日期 1985.11.15
申请人 SUMITOMO METAL IND LTD 发明人 MIYAMURA TADASHI;TAKIGAWA TOSHIKAZU
分类号 H01L21/205;H01L21/302;H01L21/3065;H01L21/31 主分类号 H01L21/205
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