发明名称 METHOD AND APPARATUS FOR INSPECTING PHOTO-MASK
摘要 PURPOSE:To inspact a photo-mask accurately by obtaining measuring patterns, the directions of measurement therefor are varied at a unit of 45 deg., from the picture data of the photo-mask and detecting the changes of each pattern. CONSTITUTION:A photo-mask is read by a scanner and the picture data are obtained, and the data are binary-coded and memorized. The direction of reading is turned at the unit of 45 deg. in the memorized picture data, and four measuring patterns are acquired. The number of times where each measuring pattern is changed into values corresponding to the conductor section and non-conductor section of the photo-mask is detected, and the parity of the number of times is discriminated and ''0'' is outputted on an odd number and ''1'' on an even number. Each output is 1 because the measuring pattern values change twice in all of the directions of reading (a)-(d). The defects of the photo-mask such as a pin hole are detected by combining outputs corresponding to each measuring pattern.
申请公布号 JPS5967633(A) 申请公布日期 1984.04.17
申请号 JP19820178776 申请日期 1982.10.12
申请人 MITSUBISHI RAYON KK 发明人 OOE AKIHIKO;FUSE MASAKI
分类号 G01N21/88;G01N21/956;G03F1/84;H01L21/027;H01L21/66 主分类号 G01N21/88
代理机构 代理人
主权项
地址