Reactor and associated method for the stabilisation processing of resins used in particular in dry etching

摘要

The subject of the invention is a method and a device for the stabilisation processing of a layer of resin constituting a mask, deposited on a substrate and intended for carrying out subsequent processings at high energy levels. This method comprises: -subjecting the substrate coated with the layer of resin 7 to the action of a fluorocarbon plasma generated in the cylindrical cell 9 by means of an excitation device 25, 23, 21 using microwaves, comprising a waveguide 21, and -then balancing the substrate thus coated at a temperature of at least 200 DEG C. Use for the production of integrated circuits. <IMAGE>