| 摘要 |
PURPOSE:To promote isolation, and to release a mask from a substrate to atmospheric pressure by radiating laser beams on the mask fast stuck after transfer. CONSTITUTION:Exposure is completed, and a mask original plate 21 and the mask 24 for reprinting are isolated. A very small amount of an air layer 30 is interposed between the masks fast stuck at that time. The air layer is brought to atmospheric pressure by a path 28 on isolation, but a return to atmospheric pressure of a section between the masks takes a long time. The air layer is brought to atmospheric pressure while He-Ne laser beams are radiated by several mW power from an opening 29, the laser beams transmit the original plate 21 and radiate the photosensitive surface of the mask 24, and the air layer 30 is expanded to promote the isolation of the masks fast stuck. When a laser output is selected to 2-10mW, the promoting effect of isolation is obtained without affecting the photosensitive surface, and work is accelerated. |
