| 摘要 |
PURPOSE:To obtain an amorphous photosensitive drum manufacturing device capable of forming a homogeneous quality film with high speed, by installing a cover above an electrode and a tray below it in a plasma CVD device, and rendering gas flow and plasma uniform. CONSTITUTION:A gas, such as monosilane, is introduced into a vacuum vessel to maintain a prescribed inside pressure, and an amorphous semiconductor film is formed on the drum by the electric discharge phenomenon. An inner quartz cylinder 42 having plural gas-passing hole and plural gas-exhausting holes and an electrode 43 having plural gas-ejecting holes are arranged around the drum set on a sample holder 41 having a built-in heater and a built-in cooling tube, and a cover 44, a tray 45 are installed above and below the electrode 43. The amorphous photosensitive drum thus obtained can form a film homogeneous in quality with raised speed, because the gas strikes the drum perpendicularly, and it is enclosed with the cover and the tray, and used sufficiently in the inside. |
