| 摘要 |
PURPOSE:To avoid the decrease in the drawing accuracy of an electromagnetic deflecting coil due to a heat generation by composing a deflection having the electromagnetic deflecting coil for deflecting an electron beam of a coil bobbin of a nonconductive and low thermal expansion material in an electron beam application apparatus. CONSTITUTION:An electron beam 2 from an electron gun 1 which is disposed on the top in a mirror barrel 3 is converged through many electron lenses 4 provided in the mirror barrel 3, deflected by an electromagnetic deflector 9, and exposed in the prescribed pattern on the surface of an article 7 to be drawn and fixed onto a movable base 6 in a lower drawing chamber 4. At this time the drawing accuracy is set in a submicron unit. In this structure, the coil 10 of the deflector 9 is formed by winding of ceramic cylindrical coil bobbin 11 of a nonconductive and low expansion material, thereby transmitting the heat generated from the coil 10 to the bobbin 11 and suppressing the thermal deformation of the coil 10 to the minimum value. In his manner, the drift of the beam is reduced to enhance the deflecting accuracy, thereby improving the drawing accuracy. |
