| 摘要 |
In a method of following a line or silhouette pattern photoelectrically, in order to control associated cutting or other equipment corners or crossovers which are unable to be traced accurately in one pass are traced in two or more passes with the aid of masks positioned in succession over the pattern. Each mask has on it additional paths or blanking portions or both to convert each corner or crossover on the pattern into an unambiguous path of curvature small enough to be followed accurately. The associated equipment is inhibited as the additional paths are followed.
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