| 摘要 |
PURPOSE:To perform developing process for pattern based on diacetylene compound is performed using aqueous solution, by a method wherein diacetylene compound including at least one phenol group or phenol derivative is coated on a substrate, and the coated film is exposed selectively and developed using an alkaline aqueous solution. CONSTITUTION:1,4-bis(3-hydroxy phenyl)butadiene is mixed with polystyrene at weight ratio 5:95, and the mixture is dissolved in methyl Cellosolve acetate and applied to a silicon wafer 1 by spin coating method and backed thereby a coatting film 2 is obtained. Electron beam is exposed selectively on the coating film 2, and an alkaline developing liquid is diluted by water in ratio 1:3, the exposed wafer is immersed in the diluted liquid thereby sensitivity 7X10<-6>C/cm<2> is obtained and line/space of 0.5mum can be resolved. Phenol group is introduced to diacetylene compound thereby the compound becomes soluble in alkaline aqueous solution and the development by aqueous solution becomes possible and the developing process may be performed using aqueous solution which is advantageous in view of working circumstances. |
