| 摘要 |
<p>PURPOSE:To eliminate dyeing stages after pattern formation and to obtain a color filter with superior spectral characteristics without causing trouble such as color mixing by forming a pattern with a photoresist colored with a dye, forming a transparent protective layer on the surface of the colored layer, and repeating said stages. CONSTITUTION:A solid-state image pickup element is coated with polybutadiene resin, and the resin is dried to smoothen the surface of the element. The smoothened surface is coated with a photoresist prepared by adding an aqueous soln. of a yellow dye and methyl-gamma-styrylpyridinium-methyl sulfate in an aqueous soln. of polyvinyl alcohol, and the photoresist is dried, exposed to ultraviolet rays through a mask having a desired pattern, and developed to form a pattern of a yellow colored layer. A transparent protective layer of polybutadiene is formed on the pattern, and a blue colored layer having a prescribed pattern is formed using a photoresist contg. a blue dye. A transparent protective layer convering the blue colored layer is then formed. Thus, a color filter with superior spectral characteristics is obtd. in simplified stages in a short time.</p> |
