| 摘要 |
A low-pressure, low-temperature organometallic chemical vapor deposition (OM-CVD) method for depositing a doped epitaxial layer of a II-VI compound, such as, n-ZnSe, on a substrate in the deposition zone of an OM-CVD reactor. For example, low-resistivity n-type ZnSe with p<0.05 OMEGA .cm and n>1017 cm-3 may be grown epitaxially on (100) GaAs substrates by this method using aluminum as a dopant from a triethylaluminum source. The as-grown layers show a strong near-bandgap photoluminescence peak. The much weaker photoluminescence intensity at longer wavelength indicates that the concentration of deep centers is lower than in doped ZnSe prepared by other prior art methods. Also, no further or post treatment (diffusion or annealing) after growth is necessary.
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