Technique for the fabrication of an iron oxide mask

摘要

Iron oxide films for "see-through" photomasks are deposited upon heated substrates by chemical vapor deposition from iron pentacarbonyl in the presence of oxygen. The solubility of the iron oxide film is found to be higher, the lower the temperature of the substrate during deposition. At temperatures below 160 degrees C., films are obtained which can be patterned at reasonable rates by photolithographic procedures using conventional mild etchants.