| 摘要 |
PURPOSE:To obtain an antireflection film resistant to 450-500 deg.C high temp. and having a superior antireflection effect, by providing a multilayered film structure consisting of alternate layers of TiO2 and SiO2 and by specifying the thickness. CONSTITUTION:When a standard set wavelength is represented by lambda0 and an odd number of layers laminated on a substrate are represented by the 1st layer, the 2nd layer - the N-th layer from the uppermost layer at the side of open air toward the lowest layer at the side of the substrate, the optical thicknesses of the 1st layer and the 2nd layer are regulated to about 0.25 lambda0 and 0.5 lambda0, respectively. The total optical thickness of the 3rd layer - the N-th layer is regulated to 0.5 lambda0 - about 0.6 lambda0, the optical thickness of the N-th layer is regulated to about 0.45 lambda0, and the layers are alternately made of SiO2 and TiO2. The 1st layer is made of SiO2. |
