CRUCIBLE FOR VAPOR DEPOSITION BY ELECTRON BEAM

摘要

PURPOSE:To improve the accuracy in setting considerably and to control the thickness of a film in vapor deposition with good accuracy in the stage of setting a crucible for vapor deposition contg. a flat plat-like vapor deposition source in the recess of a hearth, by positioning the crucible in the collar part provided to the top end thereof. CONSTITUTION:A collar part 32 in parallel with the bottom surface part 31 of a crucible is provided in the top end part of the crucible, and the parallelism between the top surfaces 33 and 31 is maintained by the contact support between the bottom surface of said collar part and the top surface 33 of the hearth. The distance between the surfaces 33 and 31 is determined solely by the depth of the crucible. The part 37 below the part 32 is made smaller than the recess 34 of the hearth so that the crucible is supported in the recess 34 not by the contact between the side surface 35 of the crucible and the side surface of the recess 34. A flat plate-like vapor deposition source 36 in the crucible is thus set with good accuracy, and the control in the film thickness using a film thickness gage of a crystal oscillator is kept free from the significant influence owing to the slight inclination of said source.