发明名称 RESISTANCE ADJUSTMENT OF THICK FILM HYBRID INTEGRATED CIRCUIT
摘要 <p>PURPOSE:To obtain high precision resistance value with less aging fluctuation without lowering working efficiency by intermittently executing the laser beam irradiation process and setting an angle between the slit for coarse adjustment and the slit for fine adjustment to an obtuse angle in the fine adjustment processes for resistance value. CONSTITUTION:A slit 3 is provided for coarse adjustment of desired resistance value, while a plurality of intermittent slits 4' provided on a thick film resistor for fine adjustment of resistance value. Working efficiency can be improved by setting an angle 5 formed by the slit 3 and slit 4' to an obtuse angle, namely by making large a changing rate of resistance by gradually narrowing the width of main current path 6 of thick film resistor body 1 and by making short the total length of the slit 4'. As described above, a resistor body receives less concentration of heat as compared with the conventional element because the laser beam is irradiated intermittently and thereby less crack is generated in the periphery of slit. Accordingly, a stable resistance value having less aging fluctuation can be obtained.</p>
申请公布号 JPS58210652(A) 申请公布日期 1983.12.07
申请号 JP19820093090 申请日期 1982.06.02
申请人 JIDOSHA KOGAI ANZEN KIKI GIJUTSU KENKYU KUMIAI 发明人 YOKOYAMA TETSUYASU;TERAJIMA KUNIO;SUZUKI MASAYOSHI
分类号 H01C17/242;H01C17/24;H01L27/01;H05K1/16 主分类号 H01C17/242
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