| 摘要 |
PURPOSE:To transfer a mask pattern to a resist on a wafer without giving strain and damage to a Roentgen-ray mask by injecting a cooling gas to the Roentgen-ray mask. CONSTITUTION:A Roentgen-ray transfer device irradiates the mask pattern to the resist on the wafer 6 through the Roentgen-ray mask 5 in an exposure tank 4 through a Roentgen-ray extracting window 3 from a vacuum tank 2 containing a Roentgen-ray source 1. The mask 5 and the wafer 6 are each supported onto a mask positioning device 7 and a wafer stage 8. A gas circulating pipe 9 is connected to the exposure tank 4, a cooler 10 and a pressure instrument 11 are inserted into the pipe 9, and an injection nozzle 12 directed to the mask 5 while penetrating a tank wall is fitted. The exposure tank 4 is filled with helium, and helium is cooled at a temperature of 0 deg.C and injected toward the mask 5. |
