发明名称 LIQUID PHASE EPITAXIAL GROWTH METHOD
摘要 PURPOSE:To obtain excellent uniformity with mixed crystals as well, by effecting epitaxial growth while realizing a supercooled state without giving any difference in time and space to the temp. of a soln., etc. CONSTITUTION:Two recesses 3, 4 are provided in the stationary part 1 of a sliding type carbon boat and a hole 5 is provided to a slider 2. A crystal 6 of a GaAs substrate having a Miller index (100) is stored in the recess 3 and a crystal 7 of a GaP solute source having a Miller index (111) is stored in the recess 4 with the (111) facets B faced upward. On the other hand, if an unsatd. In soln. 8 of P is stored in the hole 5 of the slider 2 and the slider is slid to conduct the melt 8 over the crystal 7, the crystal 7 dissolves in the soln. 8, thereby forming an In-Ga-P three-element soln. 8'. If the melt 8' is further conducted over the crystal 6 by sliding the slider 2, mixed crystal of In1-xCaxP is grown on the substrate 6.
申请公布号 JPS58190895(A) 申请公布日期 1983.11.07
申请号 JP19820072442 申请日期 1982.04.28
申请人 FUJITSU KK 发明人 ISOZUMI SHIYOUJI;KUSUKI TOSHIHIRO
分类号 C30B19/00;C30B19/04;C30B19/12;H01L21/208 主分类号 C30B19/00
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