| 摘要 |
PURPOSE:To eliminate slipping of transferred images between the devices of exposing machines, to enhance registration accuracy and yield, by employing plural chip patterns arranged on a glass substrate without perfect regularity. CONSTITUTION:A photomask used in a collective exposing machine has chips arranged slipped by DELTAx in the X axis direction, and DELTAy in the Y axis direction from a normal chip arrangement. The use of such a photomask permits perfect registration of a chip 102 obtd. by a contraction exposure machine and a chip 103 obtd. by a collective exposure machine, and enhancement of yield. Further, good registration accuracy can reduce registration allowance and it permits designing of high-density semiconductor devices. |
