| 摘要 |
PURPOSE:To give the surface of a material high cleanliness, by irradiating an electron beam oscillating it at specified amplitude on the surface of a material under high degree of vacuum, and remelting the surface. CONSTITUTION:A material 3 to be treated is placed on a table 2 in a vacuum chamber 1. After rendering the vacuum chamber 1 high degree of vacuum by a vacuum pump 4, an electron beam 5 is irradiated on the surface 3a of the material giving oscillation of hundreds hertz at amplitude of several mm., and the whole surface 3a is remelted. In this case, the table 2 is moved transversely A and longitudinally B alternately to melt the whole surface 3a and to perform vacuum degassing of the surface 3a. At the same time, floating up of pores and nonmetallic impurities is accelerated by the principle of one direction solidification and molten metal agitation caused by melting of the surface. |
