发明名称 |
PROCESS FOR REDUCING THE INTERDIFFUSION OF CONDUCTORS AND/OR SEMICONDUCTORS IN CONTACT WITH EACH OTHER |
摘要 |
The interdiffusion at the interface between a metallic-type conductor or semiconductor and a second metallic-type conductor or semiconductor in intimate contact therewith due to elevated temperatures is reduced by subjecting a surface of at least one of the materials when at an elevated temperature to a gas which contains at least one component which changes the surface potential and work function of the surface which is subjected to the gas in a direction according to the relative electronegativities of the materials. |
申请公布号 |
EP0034785(A3) |
申请公布日期 |
1983.09.28 |
申请号 |
EP19810101071 |
申请日期 |
1981.02.16 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHANG, CHIN-AN |
分类号 |
H01L21/28;H01L21/225;H01L21/321;(IPC1-7):01L21/90;01L21/31 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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