发明名称 PROCESS FOR REDUCING THE INTERDIFFUSION OF CONDUCTORS AND/OR SEMICONDUCTORS IN CONTACT WITH EACH OTHER
摘要 The interdiffusion at the interface between a metallic-type conductor or semiconductor and a second metallic-type conductor or semiconductor in intimate contact therewith due to elevated temperatures is reduced by subjecting a surface of at least one of the materials when at an elevated temperature to a gas which contains at least one component which changes the surface potential and work function of the surface which is subjected to the gas in a direction according to the relative electronegativities of the materials.
申请公布号 EP0034785(A3) 申请公布日期 1983.09.28
申请号 EP19810101071 申请日期 1981.02.16
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHANG, CHIN-AN
分类号 H01L21/28;H01L21/225;H01L21/321;(IPC1-7):01L21/90;01L21/31 主分类号 H01L21/28
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