发明名称 METHOD FOR CONTROLLING OPENING AND CLOSING OF IMPLANTATION CHAMBER LID OF ION IMPLANTATION DEVICE
摘要 PURPOSE:To protect a human body and an ion implantation device safely by attaching a light producer and a light detector opposedly in a space with which attachment of wafers to an implantation chamber and detachment of the wafers from the implantation chamber are carried out, and controlling opening and closing of the lid of the implantation chamber according to the signal of the light detector. CONSTITUTION:A disk 6 loaded with wafers 5 is installed between the implantation chamber body 4 of an ion implantation device and a lid 1 which is opened and closed by means of a hydraulic cylinder 2 and a guide 3. The wafers 5 are fixed to the disk 6 and taken off from it through a wafer attachment/detachment space 7 by rotating the disk 6. Here, a light producer 8 and a light detector 9 are fixed at both ends of the space 7 so as to form an optical beam in the space 7. An object blocking the optical beam is detected during the time when the lid 1 is closed, and according to the signal of the detector 9, the hydraulic cylinder 2 is controlled and opening and closing of the lid 1 is regulated. As a result, a human body can be protected safely during the operation of the ion implantation device, and any breakdown of a wafer-supporting member or the like can be prevented.
申请公布号 JPS58140962(A) 申请公布日期 1983.08.20
申请号 JP19820022656 申请日期 1982.02.17
申请人 HITACHI SEISAKUSHO KK 发明人 ABE KATSUNOBU;KOIKE TAKESHI
分类号 H01J37/317;H01L21/265 主分类号 H01J37/317
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