| 摘要 |
Etching method and etching and etchant removal apparatus. A specific embodiment includes two sets of fan spray nozzles located adjacent to the etching chamber and positioned to direct a spray at the work piece as the work piece exits the etching chamber. A sensor is also located adjacent to the etching chamber for turning the nozzles on when the work piece is present. Hydrometer means for determining the specific gravity of the etchant solution controls one set of nozzles whereby the nozzles are turned on to decrease the density of the etchant and turned off to increase the density of the etchant.
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